Record title
Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
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TN_cdi_doaj_primary_oai_doaj_org_article_f6830b503e5d4d48aa924a2f2f5d9661
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https://collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_f6830b503e5d4d48aa924a2f2f5d9661
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Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
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Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
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MDPI
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Micromachines (Basel), 2020, Vol.11 (9), p.864
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TN_cdi_doaj_primary_oai_doaj_org_article_f6830b503e5d4d48aa924a2f2f5d9661
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English
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TN_cdi_doaj_primary_oai_doaj_org_article_f6830b503e5d4d48aa924a2f2f5d9661
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https://collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_f6830b503e5d4d48aa924a2f2f5d9661
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